The aging of tungsten filaments and its effect on wire surface kinetics in hot-wire chemical vapor deposition

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Gas phase and surface kinetic processes in polycrystalline silicon hot-wire chemical vapor deposition

Experiments and numerical simulations have been conducted to determine critical parameters for growth of polycrystalline silicon via hot-wire chemical vapor deposition. Reactor-scale simulations performed using the Direct Simulation Monte Carlo (DSMC) method have revealed a number of important phenomena such as a sharp drop of 1700 K in the gas temperature from the wire to substrate. The gas-ph...

متن کامل

Quantitative modelling of nucleation kinetics in experiments for poly-Si growth on SiO by hot wire chemical vapor deposition

We apply a rate-equation pair binding model of nucleation kinetics to the nucleation of Si islands grown by hot wire chemical vapor deposition on SiO substrates. The grain size of poly-Si films increases with H dilution, which is attributed to atomic H 2 2 etching of Si monomers rather than stable Si clusters during the early stages of nucleation. The nucleation density increases sublinearly wi...

متن کامل

Hot-wire chemical vapor deposition for epitaxial silicon growth on large- grained polycrystalline silicon templates

We investigate low-temperature epitaxial growth of thin silicon films by HWCVD on Si w1 0 0x substrates and polycrystalline template layers formed by selective nucleation and solid phase epitaxy (SNSPE). We have grown 300-nm thick epitaxial layers at 300 8C on silicon w1 0 0x substrates using a high H :SiH ratio of 70:1. Transmission electron microscopy confirms that the 2 4 films are epitaxial...

متن کامل

Hot-Wire Chemical Vapor Deposition of Silicon and Silicon Nitride for Photovoltaics: Experiments, Simulations, and Applications

Hot-wire chemical vapor deposition is a promising technique for deposition of thin amorphous, polycrystalline, and epitaxial silicon films for photovoltaic applications. Fundamental questions remain, however, about the gas-phase and surface-kinetic processes involved. To this end, the nature of the wire decomposition process has been studied in detail by use of mass spectrometry. Atomic silicon...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Journal of Applied Physics

سال: 2002

ISSN: 0021-8979,1089-7550

DOI: 10.1063/1.1504172